发明名称 |
Photomasks and methods of fabricating the same |
摘要 |
A photomask includes a pattern area and a blind area, a first opaque pattern disposed on the blind area and having a first thickness, and a second opaque pattern disposed on the pattern area and having a second thickness smaller than the first thickness. The first and second opaque patterns are formed of the same material.
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申请公布号 |
US8592105(B2) |
申请公布日期 |
2013.11.26 |
申请号 |
US201113231313 |
申请日期 |
2011.09.13 |
申请人 |
JANG IL-YONG;KIM BYUNG-GOOK;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JANG IL-YONG;KIM BYUNG-GOOK |
分类号 |
G03F1/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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