发明名称 |
Extreme ultra violet light source device |
摘要 |
An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.
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申请公布号 |
US8586953(B2) |
申请公布日期 |
2013.11.19 |
申请号 |
US201213370074 |
申请日期 |
2012.02.09 |
申请人 |
KOMORI HIROSHI;UENO YOSHIFUMI;SOUMAGNE GEORG;GIGAPHOTON INC. |
发明人 |
KOMORI HIROSHI;UENO YOSHIFUMI;SOUMAGNE GEORG |
分类号 |
G21G4/00 |
主分类号 |
G21G4/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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