发明名称 Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for implementing the method
摘要 A substrate processing system which enables a minute piece of foreign matter attached to a substrate surface to be detected and are suitable for mass production of substrates. The substrate processing system has a substrate processing apparatus that carries out predetermined processing on a substrate. The substrate processing system comprises a substrate surface processing apparatus having a fluid supply unit that supplies onto a surface of the substrate a fluid containing an altering substance that alters a substance exposed at the surface of the substrate, and a substrate surface inspecting apparatus that inspects the surface of the substrate onto which the fluid has been supplied.
申请公布号 US8578952(B2) 申请公布日期 2013.11.12
申请号 US201113158675 申请日期 2011.06.13
申请人 NAGAIKE HIROSHI;MORIYA TSUYOSHI;TOKYO ELECTRON LIMITED 发明人 NAGAIKE HIROSHI;MORIYA TSUYOSHI
分类号 B08B3/00;B08B3/12;B08B6/00 主分类号 B08B3/00
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