发明名称 |
Non-directional dithering methods |
摘要 |
A method of data preparation in lithography processes is described. The method includes providing an integrated circuit (IC) layout design in a graphic database system (GDS) grid, converting the IC layout design GDS grid to a first exposure grid, applying a non-directional dither technique to the first exposure, coincident with applying dithering to the first expose grid, applying a grid shift to the first exposure grid to generate a grid-shifted exposure grid and applying a dither to the grid-shifted exposure grid, and adding the first exposure grid (after receiving dithering) to the grid-shifted exposure grid (after receiving dithering) to generate a second exposure grid.
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申请公布号 |
US8584057(B2) |
申请公布日期 |
2013.11.12 |
申请号 |
US201213409653 |
申请日期 |
2012.03.01 |
申请人 |
LIU PEI-YI;LIN SHY-JAY;WANG WEN-CHUAN;SHIN JAW-JUNG;LIN BURN JENG;TAIWAN SEMICONDUCTOR MANUFACTURING COPMANY, LTD. |
发明人 |
LIU PEI-YI;LIN SHY-JAY;WANG WEN-CHUAN;SHIN JAW-JUNG;LIN BURN JENG |
分类号 |
G06F17/50;G03F1/00;G06F19/00;G21K5/00 |
主分类号 |
G06F17/50 |
代理机构 |
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地址 |
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