发明名称 ASSEMBLY AND A METHOD FOR LIFTING A MODULE OF A LITHOGRAPHY SYSTEM IN A VERTICAL DIRECTION AND A LITHOGRAPHY SYSTEM COMPRISING SUCH ASSEMBLY.
摘要 <p>An assembly and a method for lifting a module of a lithography system from its support and a lithography system including such device are provided. The assembly includes a body and a track. The track comprises a ramp. The body is provided with two wheels. The first wheel vertically may extend a distance h further from a central horizontal plane of the body than the second wheel. An axis of the first wheel may be positioned in the horizontal direction at a distance D from an axis of the second wheel. The track may include a first and a second ramp. The first ramp is positioned at a distance D from the second ramp in the horizontal direction and a distance h in the vertical direction. Insertion of the body between the module and the support causes the module to be lifted from the support.</p>
申请公布号 NL2010417(C) 申请公布日期 2013.11.12
申请号 NL20132010417 申请日期 2013.03.11
申请人 MAPPER LITHOGRAPHY IP B.V. 发明人 PEIJSTER JERRY JOHANNES MARTINUS
分类号 G03F7/20;H01J37/317 主分类号 G03F7/20
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