| 摘要 |
Provided are a photo mask capable of forming a hole pattern which is fine and high definition, a pattern transfer method, and a method for manufacturing a flat panel display. Formed on a transparent substrate by at least patterning of a half light-transmitting film, the photo mask has a transfer pattern comprising a light-transmitting unit and a half light-transmitting unit, wherein the light-transmitting unit is formed by exposing of the transparent substrate in less than 5 ��of width, and the half light-transmitting unit surrounds the light-transmitting unit and is formed by the half light-transmitting film formed on the transparent substrate, and the half light-transmitting film has 2-60%of transmittance for representative wavelength of exposure light and less than 90° of phase shift amount. |
