FIELD EFFECT TRANSISTOR AND METHOD FOR FORMING THE SAME
摘要
<p>Provided is a field effect transistor which includes a drain region, a source region, and a channel region. Provided are a gate electrode which surrounds a part of the channel region and a gate insulation layer which is located between the channel region and the gate electrode. The cross section of the channel region in contact with the source region is smaller than the cross section of the channel region in contact with the drain region.</p>
申请公布号
KR20130120969(A)
申请公布日期
2013.11.05
申请号
KR20120084943
申请日期
2012.08.02
申请人
SAMSUNG ELECTRONICS CO., LTD.;POSTECH ACADEMY-INDUSTRY FOUNDATION
发明人
KIM, DONG WON;JEONG, YOON HA;KIM DAE MANN;PARK, SOO YOUNG;BAEK, ROCK HYUN;PARK, CHAN HOON;LEE, SANG HYUN