COMPOUND, RESIST COMPOSITION AND METHOD OF MANUFACTURING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition for manufacturing a resist pattern having excellent line edge roughness (LER), and a compound useful as an acid proliferating agent of the resist composition.SOLUTION: A resist composition contains (A) a resin in which solubility in alkaline aqueous solution is increased by the action of an acid, (B2) an acid generating agent that has an acid unstable group in a molecule, and (G) an acid proliferating agent that newly generates acid by the action of an acid.