发明名称 UNIT FOR LIQUID PHASE EPITAXIAL GROWTH OF MONOCRYSTALLINE SILICON CARBIDE, AND METHOD FOR LIQUID PHASE EPITAXIAL GROWTH OF MONOCRYSTALLINE SILICON CARBIDE
摘要 The cost of liquid phase epitaxial growth of a monocrystalline silicon carbide is reduced. A feed material 11 is such that when a surface layer thereof containing a polycrystalline silicon carbide with a 3C crystal polymorph is subjected to X-ray diffraction, a diffraction peak corresponding to a (111) crystal plane and a diffraction peak other than the diffraction peak corresponding to the (111) crystal plane are observed as diffraction peaks corresponding to the polycrystalline silicon carbide with a 3C crystal polymorph. A seed material 12 is such that when a surface layer thereof containing a polycrystalline silicon carbide with a 3C crystal polymorph is subjected to X-ray diffraction, a first-order diffraction peak corresponding to a (111) crystal plane is observed as a diffraction peak corresponding to the polycrystalline silicon carbide with a 3C crystal polymorph but no other first-order diffraction peak having a diffraction intensity of 10% or more of the diffraction intensity of the first-order diffraction peak corresponding to the (111) crystal plane is observed.
申请公布号 US2013285060(A1) 申请公布日期 2013.10.31
申请号 US201113995715 申请日期 2011.06.29
申请人 TORIMI SATOSHI;NOGAMI SATORU;MATSUMOTO TSUYOSHI;TOYO TANSO CO., LTD. 发明人 TORIMI SATOSHI;NOGAMI SATORU;MATSUMOTO TSUYOSHI
分类号 H01L29/04;H01L21/02;H01L29/16 主分类号 H01L29/04
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