发明名称 METHOD FOR PRODUCING AN OXIDE FILM USING A LOW TEMPERATURE PROCESS, AN OXIDE FILM AND AN ELECTRONIC DEVICE THEREOF
摘要 Disclosed are a method for producing an oxide film using a low temperature process, an oxide film and an electronic device. The method for producing an oxide film according to an embodiment of the present invention includes the steps of coating a substrate with an oxide solution, and irradiating the oxide solution coat with ultraviolet rays under an inert gas atmosphere.
申请公布号 WO2013157715(A1) 申请公布日期 2013.10.24
申请号 WO2012KR10275 申请日期 2012.11.30
申请人 KOREA ELECTRONICS TECHNOLOGY INSTITUTE;CHUNG-ANG UNIVERSITY INDUSTRY-ACADEMY COOPERATIONFOUNDATION 发明人 KIM, YONG HOON;PARK, SUNG KYU
分类号 H01L21/208;H01L21/26 主分类号 H01L21/208
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