发明名称 |
METHOD FOR PRODUCING AN OXIDE FILM USING A LOW TEMPERATURE PROCESS, AN OXIDE FILM AND AN ELECTRONIC DEVICE THEREOF |
摘要 |
Disclosed are a method for producing an oxide film using a low temperature process, an oxide film and an electronic device. The method for producing an oxide film according to an embodiment of the present invention includes the steps of coating a substrate with an oxide solution, and irradiating the oxide solution coat with ultraviolet rays under an inert gas atmosphere. |
申请公布号 |
WO2013157715(A1) |
申请公布日期 |
2013.10.24 |
申请号 |
WO2012KR10275 |
申请日期 |
2012.11.30 |
申请人 |
KOREA ELECTRONICS TECHNOLOGY INSTITUTE;CHUNG-ANG UNIVERSITY INDUSTRY-ACADEMY COOPERATIONFOUNDATION |
发明人 |
KIM, YONG HOON;PARK, SUNG KYU |
分类号 |
H01L21/208;H01L21/26 |
主分类号 |
H01L21/208 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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