METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS AND RECORDING MEDIUM

摘要

PURPOSE: A method for manufacturing a semiconductor device, a method for processing a substrate, a substrate processing apparatus and a recording medium are provided to improve freedom of choice by forming a thin film including an element like silicon in a low temperature region. CONSTITUTION: A first raw material supply system (232a) supplies a first raw material. The first raw material includes an element and a halogen group. A second raw material supply system (232b) supplies a second raw material. The second raw material includes an element and an amino group. A reducing agent supply system supplies halogen, nitrogen, and a carbon-free reducing agent.