发明名称 |
Semiconductor device contacts |
摘要 |
A method of fabrication of electrical contact structures on a semiconductor material includes depositing an oxide of a desired contact material by a chemical electroless process on a face of the semiconductor material and reducing the oxide via a chemical electroless process to produce a contact of the desired contact material. A method of fabrication of a semiconductor device incorporating such electrical contact structures and a semiconductor device incorporating such electrical contact structures are also described. |
申请公布号 |
US8563434(B2) |
申请公布日期 |
2013.10.22 |
申请号 |
US201013258849 |
申请日期 |
2010.05.18 |
申请人 |
AYOUB MOHAMED;DIERRE FABRICE;KROMEK LIMITED |
发明人 |
AYOUB MOHAMED;DIERRE FABRICE |
分类号 |
H01L21/44 |
主分类号 |
H01L21/44 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|