发明名称 |
Photolithography exposure apparatus having blinding plates and method of driving the same |
摘要 |
An exposure apparatus includes a light source for providing bursts of photolithographic exposure light, a mask for applying a pattern to the photolithographic exposure light, a variable length blind for blocking parts of an exposure window from receiving the photolithographic exposure light and a blind driver for controllably driving the variable length blind. The blind includes a plurality of movable blocking plates. The blind driver includes a plurality of motors and a motor control unit which are structured to rapidly return one or more of the blocking plates through the exposure window in a time duration between the bursts of photolithographic exposure light so that a return stain is not formed on the substrate. In one embodiment, the substrate is a mother substrate having a plurality of LCD daughter substrates being formed thereon. |
申请公布号 |
US8564762(B2) |
申请公布日期 |
2013.10.22 |
申请号 |
US201113086293 |
申请日期 |
2011.04.13 |
申请人 |
KIM CHANG-HOON;AHN BO-KYOUNG;YOO HONG-SUK;SAMSUNG DISPLAY CO., LTD. |
发明人 |
KIM CHANG-HOON;AHN BO-KYOUNG;YOO HONG-SUK |
分类号 |
G02B26/02;G03B27/32;G03B27/42;G03B27/54;G03B27/72 |
主分类号 |
G02B26/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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