| 摘要 |
PURPOSE: An extreme ultraviolet (EUV) light generator including an infrared (IR) laser beam attenuation function is provided to prevent damage to optical systems. CONSTITUTION: An EUV generator comprises a laser source (100), a tunable laser mirror (TLM) (220), a focusing mirror (FM) (230), a gas cell (240), a pinhole (250), and a vacuum chamber. The laser source outputs the laser. The TLM reflects the laser beam outputted from the laser source. The FM focuses the laser beam reflected in the TLM. The gas cell generates EUV by forming the plasma with a response gas and the laser beam from a gas supply line for a plasma induction line corresponding to a focus point in the FM. The pinhole forms a hole for attenuating an IR femto base laser beam included in ultraviolet light generated from a gas cell. The vacuum chamber comprises the TLM, the FM, the gas cell, and the pinhole. |
