发明名称 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE TRANSFER METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND STATE DETECTION PROGRAM
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which detects the occurence of abnormality of a holding member and a substrate in advance even when the substrate is held by a substrate holder to which the holding member is mounted, and to provide a substrate transfer method, a manufacturing method of a semiconductor device, and a state detection program.SOLUTION: A substrate processing apparatus includes: a substrate holder 7 which mounts holding members for placing a substrate 2 thereon and holds the substrate 2; a substrate transfer part 17 formed so as to transfer multiple or one substrate 2; a detection part 41 detecting the state of the holding member mounted to the substrate holder 7; a determination part 47 that compares data indicating the state of the holding member that is obtained by the detection part 41 and criterial master data obtained by detecting the holding member in a normal state in advance and determines the state of the holding member itself; and a transfer control part 49 controlling the substrate transfer part 17 according to the determination result of the determination part 47.
申请公布号 JP2013214723(A) 申请公布日期 2013.10.17
申请号 JP20130014548 申请日期 2013.01.29
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 KAWASAKI JUNICHI;ABIKO HAJIME
分类号 H01L21/677;C23C16/44;H01L21/31 主分类号 H01L21/677
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