发明名称 |
METHODS OF PROVIDING PATTERNED EPITAXY TEMPLATES FOR SELF-ASSEMBLABLE BLOCK COPOLYMERS FOR USE IN DEVICE LITHOGRAPHY |
摘要 |
A method is disclosed to form a patterned epitaxy template, on a substrate, to direct self-assembly of block copolymer for device lithography. A resist layer on a substrate is selectively exposed with actinic (e.g. UV or DUV) radiation by photolithography to provide exposed portions in a regular lattice pattern of touching or overlapping shapes arranged to leave unexposed resist portions between the shapes. Exposed or unexposed resist is removed with remaining resist portions providing the basis for a patterned epitaxy template for the orientation of the self-assemblable block copolymer as a hexagonal or square array. The method allows for simple, direct UV lithography to form patterned epitaxy templates with sub-resolution features. |
申请公布号 |
WO2013152928(A1) |
申请公布日期 |
2013.10.17 |
申请号 |
WO2013EP55681 |
申请日期 |
2013.03.19 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
WUISTER, SANDER;BANINE, VADIM;FINDERS, JOZEF;KOOLE, ROELOF;PEETERS, EMIEL;SINGH, HARMEET |
分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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