METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device, along with a substrate processing apparatus, capable of effectively excluding an element contained in cleaning gas.SOLUTION: A method of manufacturing a semiconductor device includes a pre-film-forming step in which a film is formed on the surface of an inner wall of a process chamber by supplying a plurality of process gases into the process chamber in such a manner as the plurality of process gases are mixed without being plasma-excited, and a practical film forming step for forming a film on the substrate by alternately supplying the process chamber with the plurality of process gases in which at least one process gas is plasma-excited not to mix them each other, under a state in which the substrate is stored in the process chamber.