| 摘要 |
PURPOSE: A substrate processing apparatus is provided to prevent the pollution of a movement collection bath by opening the movement collection bath only when a rinse-drying process is performed. CONSTITUTION: A process chamber (100) has a space for cleaning a substrate. The process chamber includes collection baths, a first elevating member, and a second elevating member. A substrate support member (200) is formed in the space. The substrate support member supports the substrate. An injecting member (300) selectively injects process liquids onto substrates placed in the substrate support member. |
