| 摘要 |
PURPOSE: A method for manufacturing a semiconductor device, a substrate processing apparatus, and a recording medium are provided to improve an operation rate by reducing maintenance time. CONSTITUTION: A processing gas supply unit supplies a processing gas to a processing chamber (201). A cleaning gas supply unit supplies a cleaning gas to the processing chamber. A modifying gas supply unit supplies a modifying gas to the processing chamber. An exhaust unit exhausts the processing chamber. A control unit controls the processing gas supply unit, the cleaning gas supply unit, the modifying gas supply unit, and the exhaust unit. |
