| 摘要 |
PURPOSE: A vapor deposition apparatus for depositing mixtures is provided to uniformly form a doping layer on a substrate by including a top crucible to generate mixed deposit steam by mixing host deposit steam with dopant deposit steam. CONSTITUTION: A bottom crucible (201) is divided into a host deposit storage (201b) and a dopant deposit storage (201c) by a partition (201a). The bottom crucible generates host deposit steam and dopant deposit steam by heating a host deposit and a dopant deposit. A mixing plate (202) includes a spray unit (202a) which sprays the host deposit steam and the dopant deposit steam. A top crucible (203) includes one or more depositing units. The top crucible generates mixed deposit steam by mixing the host deposit steam with the dopant deposit steam. |
