发明名称 |
METHODS AND APPARATUS FOR SUPPLYING PROCESS GAS IN A PLASMA PROCESSING SYSTEM |
摘要 |
<p>Methods and apparatus for supplying gas in a plasma processing system that employs the single line drop approach wherein a regulator is shared among multiple mass flow controllers. In one or more embodiments, an accumulator is provided and coupled in gaseous communication with a shared manifold to reduce pressure spikes and dips. A filter, which may be replaceable or non-replaceable separate from the accumulator, is integrated with the accumulator in one or more embodiments.</p> |
申请公布号 |
WO2013148475(A1) |
申请公布日期 |
2013.10.03 |
申请号 |
WO2013US33374 |
申请日期 |
2013.03.21 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
SHAREEF, IQBAL;SPYROPOULOS, EVANGELOS;TASKAR, MARK |
分类号 |
C23C16/455 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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