发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 [Problem] To provide a photosensitive resin composition. [Solution] A photosensitive resin composition containing component (A), component (B) and a solvent. Component (A): A copolymer having a structural unit represented by formula (1) and a structural unit represented by formula (2). Component (B): A photosensitizer. (In the formulae, R0 denotes a hydroxyl group or a carboxyl group, R1 denotes a hydrogen atom or a methyl group, R2 denotes a single bond or an alkylene group having 1-5 carbon atoms, and R3 denotes a thermally crosslinkable monovalent organic group. However, the R1 groups may be different from each other in the case of a plurality of structural units represented by formula (2).)
申请公布号 WO2013146360(A1) 申请公布日期 2013.10.03
申请号 WO2013JP57447 申请日期 2013.03.15
申请人 NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 ADACHI, ISAO;SAKAGUCHI, TAKAHIRO;SODA, HIROYUKI
分类号 G03F7/023;C08F220/10;C08F222/40;G02B3/00;G03F7/004;H01L21/027 主分类号 G03F7/023
代理机构 代理人
主权项
地址
您可能感兴趣的专利