发明名称 |
METHODS OF PROVIDING PATTERNED TEMPLATES FOR SELF-ASSEMBLABLE BLOCK COPOLYMERS FOR USE IN DEVICE LITHOGRAPHY |
摘要 |
<p>A method is disclosed to form a patterned template on a substrate, to direct orientation of a self-assemblable block copolymer. The method involves providing a resist layer of a positive tone resist on the substrate and overexposing the resist with actinic (e.g. UV) radiation by photolithography to expose a continuous region of the resist layer with a sub-resolution unexposed resist portion at the interface between the resist and the substrate. The resist portion remaining at the interface, after removal of the exposed region, provides a basis for a chemical epitaxy template. The method may allow for simple, direct photolithography to form a patterned chemical epitaxy template and optionally include an accurately co-aligned graphoepitaxy feature and/or a substrate alignment feature.</p> |
申请公布号 |
WO2013143813(A1) |
申请公布日期 |
2013.10.03 |
申请号 |
WO2013EP54502 |
申请日期 |
2013.03.06 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
SINGH, HARMEET;BANINE, VADIM;FINDERS, JOZEF;WUISTER, SANDER;KOOLE, ROELOF;PEETERS, EMIEL |
分类号 |
G03F7/00;G03F7/20 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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