发明名称 ELECTRICAL-FREE DUMMY GATE
摘要 The present disclosure provides a semiconductor device. The semiconductor device includes an electrical-free dummy gate formed over a substrate. The dummy gate has an elongate shape and is oriented along a first direction. The semiconductor device includes a first functional gate formed over the substrate. The first functional gate has an elongate shape and is oriented along the first direction. The first functional gate is separated from the dummy gate in a second direction perpendicular to the first direction. A first conductive contact is formed on the first functional gate. The semiconductor device includes a second functional gate formed over the substrate. The second functional gate has an elongate shape and is oriented along the first direction. The second functional gate is aligned with and physically separated from the dummy gate in the first direction. A second conductive contact is formed on the second functional gate.
申请公布号 US2013256809(A1) 申请公布日期 2013.10.03
申请号 US201213431072 申请日期 2012.03.27
申请人 LIU CHIA-CHU;CHEN KUEI SHUN;MU-CHI CHIANG;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. 发明人 LIU CHIA-CHU;CHEN KUEI SHUN;MU-CHI CHIANG
分类号 H01L29/423;H01L21/283;H01L27/088 主分类号 H01L29/423
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