METHOD OF PROTECTING COMPONENT OF FILM FORMING APPARATUS AND FILM FORMING METHOD

摘要

PURPOSE: A method for protecting the component of a film forming apparatus and a film forming method are provided to relieve a tensile stress by using a silicon layer as a coating layer for protecting a component. CONSTITUTION: A rough surface layer (2) is formed on the surface of a component (1) before or after a film forming process is performed on an object substrate in the process room of a film forming apparatus. The component is formed in the process chamber of the film forming apparatus. The component is exposed under a film forming atmosphere in the film forming process.