发明名称 Process for manufacturing semiconductor devices
摘要 In a process for manufacturing a semiconductor device comprising heating a wiring board on which a chip and an uncured adhesive layer are laminated for curing the adhesive layer, the improvement includes performing a statically pressurizing step before the adhesive layer is cured, in which step the wiring board on which the chip and the uncured adhesive layer are laminated is subjected to a static pressure greater than atmospheric pressure by not less than 0.05 MPa. According to the process, voids are easily eliminated irrespective of the design of the wiring board, and the adhesive is prevented from curling up on the chip.
申请公布号 US8545663(B2) 申请公布日期 2013.10.01
申请号 US20070835606 申请日期 2007.08.08
申请人 YAMAZAKI OSAMU;ICHIKAWA ISAO;SAIKI NAOYA;LINTEC CORPORATION 发明人 YAMAZAKI OSAMU;ICHIKAWA ISAO;SAIKI NAOYA
分类号 B29C65/00;B32B37/00;C08J5/00;C09J5/02;H01L21/00 主分类号 B29C65/00
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