发明名称 FIELD-EFFECT TRANSISTOR STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a field-effect transistor structure which can improve mobility properties and threshold voltage distribution, and a semiconductor device and an integrated circuit device that include the same.SOLUTION: The field-effect transistor structure has an element isolation film on a substrate, and a fin extending from the substrate and protruding through the element isolation film. The fin comprises a threshold voltage adjustment region doped with impurities of a first concentration, and a carrier region doped with impurities of a second concentration lower than the first concentration.
申请公布号 JP2013197596(A) 申请公布日期 2013.09.30
申请号 JP20130058507 申请日期 2013.03.21
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 OH CHANG-WOO;KANG MYUNG GIL;KIM BOM-SU;YOON JONGSIK
分类号 H01L21/336;H01L21/8238;H01L27/092;H01L29/78;H01L29/786 主分类号 H01L21/336
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