发明名称 |
FIELD-EFFECT TRANSISTOR STRUCTURE |
摘要 |
PROBLEM TO BE SOLVED: To provide a field-effect transistor structure which can improve mobility properties and threshold voltage distribution, and a semiconductor device and an integrated circuit device that include the same.SOLUTION: The field-effect transistor structure has an element isolation film on a substrate, and a fin extending from the substrate and protruding through the element isolation film. The fin comprises a threshold voltage adjustment region doped with impurities of a first concentration, and a carrier region doped with impurities of a second concentration lower than the first concentration. |
申请公布号 |
JP2013197596(A) |
申请公布日期 |
2013.09.30 |
申请号 |
JP20130058507 |
申请日期 |
2013.03.21 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
OH CHANG-WOO;KANG MYUNG GIL;KIM BOM-SU;YOON JONGSIK |
分类号 |
H01L21/336;H01L21/8238;H01L27/092;H01L29/78;H01L29/786 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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