PURPOSE: A method for forming a field effect transistor is provided to improve the efficiency of a process by easily forming fin parts with different widths. CONSTITUTION: A substrate (100) is prepared. The substrate includes a first region and a second region. Fin parts are formed on the first region and the second region. A first mask pattern (201) is formed on the substrate. The widths of the fin parts are increased or decreased on the first region.
申请公布号
KR20130106091(A)
申请公布日期
2013.09.27
申请号
KR20120027735
申请日期
2012.03.19
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
OH, CHANG WOO;MIN, SHIN CHEOL;LEE, JONG WOOK;LEE, CHOONG HO