发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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申请公布号 |
US2013250270(A1) |
申请公布日期 |
2013.09.26 |
申请号 |
US201213615190 |
申请日期 |
2012.09.13 |
申请人 |
LOF JOERI;BIJLAART ERIK THEODORUS MARIA;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;LOOPSTRA ERIK ROELOF;MEIJER HENDRICUS JOHANNES MARIA;MERTENS JEROEN JOHANNES SOPHIA MARIA;MULKENS JOHANNES CATHARINUS HUBERTUS;RITSEMA ROELOF AEILKO SIEBRAND;SENGERS TIMOTHEUS FRANCISCUS;SIMON KLAUS;DE SMIT JOANNES THEODOOR;STRAAIJER ALEXANDER;STREEFKERK BOB;DERKSEN ANTONIUS THEODORUS ANNA MARIA;ASML NETHERLANDS B.V. |
发明人 |
LOF JOERI;BIJLAART ERIK THEODORUS MARIA;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;LOOPSTRA ERIK ROELOF;MEIJER HENDRICUS JOHANNES MARIA;MERTENS JEROEN JOHANNES SOPHIA MARIA;MULKENS JOHANNES CATHARINUS HUBERTUS;RITSEMA ROELOF AEILKO SIEBRAND;SENGERS TIMOTHEUS FRANCISCUS;SIMON KLAUS;DE SMIT JOANNES THEODOOR;STRAAIJER ALEXANDER;STREEFKERK BOB;DERKSEN ANTONIUS THEODORUS ANNA MARIA |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
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