发明名称 TRANSPARENT OXIDE FILM AND METHOD OF PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a zinc oxide-based transparent oxide film which has a low refractive index and excellent gas barrier properties, and to provide a method of producing the same.SOLUTION: A transparent oxide film is amorphous, and has a composition which contains, based on the total metal component amount, 0.9-20.0 at% Al and 25.5-68.0 at% Si with the balance consisting of Zn and unavoidable impurities. In a production method, DC sputtering is conducted under the environment being at least one of in an inert gas atmosphere that contains oxygen and in the state of heating a substrate, using a sputtering target consisting of an oxide sintered compact which has a composition that contains, based on the total metal component amount, 0.3-4.0 wt% Al and 6.0-14.5 wt% Si with the balance consisting of Zn and unavoidable impurities, and has a composite oxide ZnSiOand ZnO present in the structure of the sintered compact.
申请公布号 JP2013189657(A) 申请公布日期 2013.09.26
申请号 JP20120039041 申请日期 2012.02.24
申请人 MITSUBISHI MATERIALS CORP 发明人 YAMAGUCHI TAKESHI;CHO SHUHIN;KONDO YUICHI
分类号 C23C14/34;C04B35/453 主分类号 C23C14/34
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