FILM FORMING APPARATUS, METHOD FOR FORMING FILM AND METHOD FOR CLEANING SHADOW MASK

摘要

PROBLEM TO BE SOLVED: To provide a film forming apparatus that can remove a film forming material attached to a shadow mask, and also to provide a method for forming a film and a method for cleaning a shadow mask.SOLUTION: A film forming apparatus includes a film forming chamber including an evaporation source, a shadow mask transfer mechanism, and a plasma source. The film forming apparatus includes: a first mode in which a film is formed on an object to be film-formed with a film forming material ejected by the evaporation source while the object to be film-formed and a shadow mask are transferred in a state where the object and the shadow mask are overlapped with each other by the shadow mask transfer mechanism; and a second mode in which plasma irradiation is performed by the plasma source to remove the film forming material attached to the shadow mask while the evaporation source is parted from the plasma source by a sluice valve, and the shadow mask is transferred in a state where the shadow mask is held by the shadow mask transfer mechanism.