| 摘要 |
<p>The purpose of the present invention is to provide a pattern sensing device for generating appropriate reference pattern data while suppressing an increase in manufacturing cost due to a minute change in manufacturing conditions. The present invention is a pattern sensing device provided with a computational processing device for measuring a pattern formed on a test sample, and is characterized in that the computational processing device acquires or generates image data or contour line data of a plurality of circuit patterns for which manufacturing conditions in a manufacturing device differ, on the basis of a signal obtained by a charged particle beam device, and generates reference data used to measure the circuit patterns from the image data or contour line data.</p> |
