SIGE HETEROJUNCTION BIPOLAR TRANSISTOR WITH SHALLOW OUT-DIFFUSED P+ EMITTER REGION
摘要
<p>A pnp SiGe heterojunction bipolar transistor (HBT) (300) reduces the rate that p-type dopant atoms in the p+ emitter (310) of the transistor out diffuse into a lowly-doped region of the base (150) of the transistor by epitaxially growing the emitter to include a single-crystal germanium region (316) and an overlying single-crystal silicon region (318).</p>
申请公布号
WO2013142862(A1)
申请公布日期
2013.09.26
申请号
WO2013US33709
申请日期
2013.03.25
申请人
TEXAS INSTRUMENTS INCORPORATED;TEXAS INSTRUMENTS JAPAN LIMITED