发明名称 SIGE HETEROJUNCTION BIPOLAR TRANSISTOR WITH SHALLOW OUT-DIFFUSED P+ EMITTER REGION
摘要 <p>A pnp SiGe heterojunction bipolar transistor (HBT) (300) reduces the rate that p-type dopant atoms in the p+ emitter (310) of the transistor out diffuse into a lowly-doped region of the base (150) of the transistor by epitaxially growing the emitter to include a single-crystal germanium region (316) and an overlying single-crystal silicon region (318).</p>
申请公布号 WO2013142862(A1) 申请公布日期 2013.09.26
申请号 WO2013US33709 申请日期 2013.03.25
申请人 TEXAS INSTRUMENTS INCORPORATED;TEXAS INSTRUMENTS JAPAN LIMITED 发明人 BABCOCK, JEFFREY, A.;SADOVNIKOV, ALEXEI
分类号 H01L29/73 主分类号 H01L29/73
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