| 摘要 |
A method and apparatus for manufacturing thin films is described, wherein, in a deposition system comprising an inner non-airtight enclosure for containing at least one substrate, an outer airtight chamber completely surrounding said enclosure, an exhaust operatively connected to both, said inner chamber is kept at a pressure lower than the pressure within said outer enclosure, especially a pressure difference of less than I mbar. The apparatus may exhibit two butterfly vents arranged between inner enclosure, outer chamber and an exhaust for controlling said pressure difference.
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