发明名称 |
METHODS AND APPARATUS FOR CORRECTING FOR NON-UNIFORMITY IN A PLASMA PROCESSING SYSTEM |
摘要 |
A plasma processing system having a plasma processing chamber comprising at least one of a chamber wall and a chamber liner is disclosed. The plasma processing system includes a plurality of ground straps disposed around a circumference of a chamber surface, the chamber surface being one of the chamber walls and the chamber liner of the plasma processing chamber. The plasma processing system further includes at least a first impedance device coupled to at least a first ground strap of the plurality of ground straps, wherein a second ground strap of the plurality of ground straps is not provided with a second impedance device having the same impedance value as the first impedance device.
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申请公布号 |
US2013240145(A1) |
申请公布日期 |
2013.09.19 |
申请号 |
US201213423279 |
申请日期 |
2012.03.19 |
申请人 |
NAM SANG KI;DHINDSA RAJINDER |
发明人 |
NAM SANG KI;DHINDSA RAJINDER |
分类号 |
H05B31/28;B05C9/00;B05C11/00 |
主分类号 |
H05B31/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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