ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS

摘要

PURPOSE: An acid generator is provided to be simply synthesized and to enable a wide-range molecular design for molecular designing by the condition of a necessary resist. CONSTITUTION: An acid generator is sensitive to high energy beams or heat, and generates sulfonic acid denoted by general formula 1. A chemically amplified resist composition contains a base resin, the acid generator, a quencher, and an organic solvent. A pattern formation method comprises: a step of coating the chemically amplified resist composition on a substrate; a step of exposing the substrate using a photomask and KrF excimer laser, ArF excimer laser, EUV lithography, or electronic beams; and developing the substrate using a developer after heating.