发明名称 PROCESS MONITORING DEVICE AND PROCESS MONITORING METHOD IN SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 Provide is a process monitoring device in a semiconductor manufacturing apparatus that can readily and reliably monitor the process in the semiconductor manufacturing apparatus. The process monitoring device includes a storage unit that stores a normal state moving image data indicating a normal state of the process; an image capturing unit that captures an image of a state of the process to be monitored to acquire a moving image data; an abnormality level calculation unit configured to extract a feature amount for each frame of the moving image data and the normal state moving image data, and calculate an abnormality level based on the extracted feature amount; and a display unit that displays the abnormality level calculated by the abnormality level calculation unit in association with a frame position of the moving image data.
申请公布号 US2013236088(A1) 申请公布日期 2013.09.12
申请号 US201313783624 申请日期 2013.03.04
申请人 TOKYO ELECTRON LIMITED 发明人 UMEHARA YASUTOSHI;OKADA MOTOI;IWANAGA SHUJI
分类号 G06T7/00 主分类号 G06T7/00
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