发明名称 |
FILM-FORMING APPARATUS, AND METHOD FOR CLEANING FILM-FORMING APPARATUS |
摘要 |
A film-forming apparatus includes a heat generator exposed to a film-forming gas drawn into a chamber to generate film formation species. A film-forming gas supply system supplies the film-forming gas into the chamber. A control unit sets the heat generator in a non-heated state during a cleaning process that discharges a film formation residue from the chamber. A cleaning gas supplying system supplies a cleaning gas including ClF3 into the chamber. A temperature adjustment unit adjusts the chamber to a target temperature from 100° C. or higher to 200° C. or less in the cleaning process. A discharge system discharges a reaction product produced by a reaction between the film formation residue and the cleaning gas from the chamber.
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申请公布号 |
KR20130100339(A) |
申请公布日期 |
2013.09.10 |
申请号 |
KR20137012402 |
申请日期 |
2011.11.22 |
申请人 |
ULVAC, INC. |
发明人 |
OGAWA YOHEI;TOYODA SATORU;OKAMURA YOSHIHIRO |
分类号 |
C23C16/44 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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