发明名称 OXIDE SPUTTERING TARGET AND PROTECTIVE FILM FOR OPTICAL RECORDING MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide an oxide sputtering target capable of forming a flexible and difficult-to-crack film with high sustaining property as a protective film of an optical recording medium, and capable of performing DC sputtering with few particles generated during the sputtering.SOLUTION: An oxide sputtering target includes, with respect to the total amount of the metal component, 0.15 at% or more in total of one or more among Al, Ga, and In, 7 at% or more of Sn, 36 at% or less in total of Al, Ga, In, and Sn, and the balance comprising Zn and unavoidable impurities.
申请公布号 JP2013177676(A) 申请公布日期 2013.09.09
申请号 JP20130010035 申请日期 2013.01.23
申请人 MITSUBISHI MATERIALS CORP 发明人 SAITO ATSUSHI;MORI RIE
分类号 C23C14/34 主分类号 C23C14/34
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