| 摘要 |
<p>The purpose of the present invention is to provide a semiconductor evaluation device that suitably produces a reference pattern used in comparative inspections, etc. A semiconductor evaluation device having as another purpose thereof the extraction of a process window having a more precise range, on the basis of a two-dimensional evaluation of patterns, and a computer program are described. In order to achieve said purposes, the present invention provides a semiconductor evaluation device that: measures the dimensions of a pattern formed upon a sample, on the basis of signals obtained by a charged particle beam device; combines outline data obtained from an image of a pattern having the same shape in the design data, said pattern being a pattern for which the dimension measurement results fulfill prescribed conditions, a pattern for which the exposure conditions when the above pattern was formed are selected and the pattern then formed under the selected exposure conditions, or a pattern that is in a known positional relationship with the selected pattern; and forms combined outline data.</p> |
