PHOTOSENSITIVE SILOXANE COMPOSITION, CURED FILM FORMED THEREFROM, AND ELEMENT HAVING THE CURED FILM

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive siloxane composition giving a cured film with both characteristics of high heat resistance and high transparency and with good film thickness uniformity; also a cured film such as a planarizing film for a TFT substrate, an insulating film for a touch panel or a protective film, which is formed from the above photosensitive siloxane composition; and a display element having the cured film.SOLUTION: A photosensitive siloxane composition contains (a) a polysiloxane synthesized by reaction of one or more kinds of organosilane having a certain structure, (b) a naphthoquinone diazide compound, (c) a solvent and (d) a fluorine-based surfactant having a perfluoroalkyl group with a carbon number of 7 or less.