发明名称 Semiconductor Devices and Methods of Fabricating the Same
摘要 A semiconductor device includes capacitors connected in parallel. Electrode active portions and a discharge active portion are defined on a semiconductor substrate, and capping electrodes are disposed respectively on the electrode active portions. A capacitor-dielectric layer is disposed between each of the capping electrodes and each of the electrode active portions that overlap each other. A counter doped region is disposed in the discharge active portion. A lower interlayer dielectric covers the entire surface of the semiconductor substrate. Electrode contact plugs respectively contact the capping electrodes through the lower interlayer dielectric, and a discharge contact plug contacts the counter doped region through the lower interlayer dielectric. A lower interconnection is disposed on the lower interlayer dielectric and contacts the electrode contact plugs and the discharge contact plug.
申请公布号 US2013230963(A1) 申请公布日期 2013.09.05
申请号 US201313868752 申请日期 2013.04.23
申请人 SAMSUNG ELECTRONICS CO., LTD;SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM MYOUNGSOO;CHOI YOONKYUNG;LEE EUN YOUNG;JO SUNGIL
分类号 H01L49/02 主分类号 H01L49/02
代理机构 代理人
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