发明名称 CHARGED PARTICLE BEAM APPARATUS PERMITTING HIGH RESOLUTION AND HIGH-CONTRAST OBSERVATION
摘要 A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.
申请公布号 US2013228701(A1) 申请公布日期 2013.09.05
申请号 US201313871624 申请日期 2013.04.26
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 FUKUDA MUNEYUKI;SUZUKI NAOMASA;SHOJO TOMOYASU;TAKAHASHI NORITSUGU
分类号 G01N23/225 主分类号 G01N23/225
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