| 摘要 |
PURPOSE: A manufacturing method of nanostructure using block copolymer queue is provided to manufacture nanostructures by a single process. CONSTITUTION: A manufacturing method of nanostructure using block copolymer queue comprises the following steps: laminating a reactive layer(120) on a substrate(110); forming a plurality of convex portions(131) on the reactive layer to be separated from each other; forming a free pattern(140) by etching and redeposition; removing the convex portions; removing the reactive layer remained on a substrate between the neighboring free patterns; and arranging block copolymer pattern(150) between the neighboring free patterns. |
