| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a photoelectric conversion element, which is capable of reducing contact resistance between an electrode and a diffusion region while avoiding deterioration in characteristics.SOLUTION: The method for manufacturing a photoelectric conversion element according to the present invention comprises the steps of: forming diffusion regions (16, 18) in which impurities are diffused, on the rear surface side of a silicon substrate (12); printing electrode pastes (28a, 28b) at positions corresponding to part of the diffusion regions (16, 18); and irradiating the electrode pastes (28a, 28b) with laser beams (30). |
