SILICON-CONTAINING SURFACE MODIFIER, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING THE SAME, AND PATTERNING PROCESS

摘要

PROBLEM TO BE SOLVED: To provide a resist underlayer film applicable not only to a negatively developed resist pattern formed by a hydrophilic organic compound but also to a conventional positively developed resist pattern formed by a hydrophobic compound.SOLUTION: A silicon-containing surface modifier contains one or more of a repeating unit shown by the specified general formula (A) and a partial structure shown by the specified general formula (C).