| 摘要 |
PURPOSE: A retainer ring for a chemical mechanical polishing device with a drain hole is provided to effectively discharge slurry by preventing the generation of a vortex when the slurry flows from the inside of the drain hole to the outside. CONSTITUTION: A retainer ring for a chemical mechanical polishing device includes an upper face, a lower face, and a side face. The upper face includes a combination unit combining the chemical mechanical polishing device. The lower face includes a drain groove where slurry passes through in a polishing process of the chemical mechanical polishing device. A drain hole (160) is punched on the side face from the inside to the outside to make the slurry pass through in the polishing process of the chemical mechanical polishing device. An inner wall (170) is extended in the direction that the drain hole is punched and one end of the inner wall is rounded. |
