发明名称 DUAL GATE LATERAL MOSFET
摘要 <p>PURPOSE: A double gate horizontal type metal oxide semiconductor field effect transistor (MOSFET) is provided to deliver more currents per unit area by supplying a short channel between a drain and a source. CONSTITUTION: A first area of second conductivity is formed on a board (103). A body area (122) of first conductivity is formed in the first area. An isolation area (104) is formed in the first area. A second area of the second conductivity is formed in the first area. A third area of the second conductivity is formed in the first area.</p>
申请公布号 KR20130095611(A) 申请公布日期 2013.08.28
申请号 KR20120106629 申请日期 2012.09.25
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHEN PO YU
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
代理机构 代理人
主权项
地址