| 摘要 |
Provided is a film forming apparatus which forms a film on a substrate held within a film forming container by supplying raw material gas onto the substrate. The apparatus includes: a supply mechanism which supplies the raw material gas into the container; an exhaust mechanism which exhausts gas from the container; a trap unit which is disposed in the course of an exhaust passage through which gas flows from the container to the exhaust mechanism, and traps the raw material gas by extracting a product containing the raw material gas; a purge gas supplying unit which is connected to join the exhaust passage between the container and the trap unit and supplies purge gas into the exhaust passage; and a pressure gauge which is disposed in a purge gas supplying passage through which the purge gas flows from the purge gas supplying unit into the exhaust passage. |
