发明名称 Shower head and chemical vapor deposition device having the same
摘要 PURPOSE: A shower head and a chemical vapor deposition apparatus using the same are provided to reduce costs required for the manufacture, maintenance, and repair of the shower head by detachably combining a plurality of gas chambers with a supporting plate. CONSTITUTION: A plurality of gas chambers(220) is detachably combined with a supporting plate by a coupling screw. A gas supply pipe(240) is branched to the plurality of gas chambers. The gas supply pipe supplies process gas. A plurality of refrigerant circulation paths(270) is respectively installed in the plurality of gas chambers. The plurality of refrigerant circulation paths circulates refrigerant. A refrigerant discharge pipe discharges the refrigerant discharged in the plurality of refrigerant circulation paths. A plurality of sealing members is respectively installed between the supporting plate and the plurality of gas chambers.
申请公布号 KR101300119(B1) 申请公布日期 2013.08.26
申请号 KR20110010721 申请日期 2011.02.07
申请人 发明人
分类号 C23C16/44;C23C16/455;H01L21/205 主分类号 C23C16/44
代理机构 代理人
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